| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a simple drying apparatus which uniformizes a vaporization rate in a coating area and carries out drying in drying step of a coating film in a state without the fluidization of a liquid material so that a substrate with good flatness is obtained. <P>SOLUTION: Solvent vapor is supplied from outside to the peripheral part of the coating area with a great gradient of the vapor pressure of the solvent and high to vaporization rate, so that the gradient of the vapor pressure in this area is lowered to uniformize the vaporization rate in the coating area. Thus, the fluidization of the liquid material caused by a difference of the vaporization rate in the coating area is depressed to carry out a total heating drying. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
