| 摘要 |
PROBLEM TO BE SOLVED: To secure uniformity in ITO dry etching in a method of fabricating a liquid crystal display device, wherein an electrically conductive transparent film is pattern-formed on an interlayer insulating film comprised of at least an electrically insulating organic film. SOLUTION: A process to open contact holes 26, 27 on a passivation film 32 includes: a step to pattern form a photoresist on the interlayer insulating film; and a step to apply dry-etching to the passivation film 32 with the photoresist being used as a mask not through a step for post-baking the photoresist. COPYRIGHT: (C)2007,JPO&INPIT |
