发明名称 半導体装置製造用仮接着剤、並びに、それを用いた接着性支持体、及び、半導体装置の製造方法
摘要 The invention is directed to a temporary adhesive for production of semiconductor device, containing (A) a polymer compound having an acid group, (B) a diluent, and (C) a solvent, an adhesive support including a substrate and an adhesive layer formed from the temporary adhesive for production of semiconductor device, and a production method of semiconductor device having a member processed including: adhering a first surface of a member to be processed to a substrate through an adhesive layer formed from the temporary adhesive for production of semiconductor device as claimed; conducting a mechanical or chemical processing on a second surface which is different from the first surface of the member to be processed to obtain the member processed; and releasing the first surface of the member processed from the adhesive layer.
申请公布号 JP6031264(B2) 申请公布日期 2016.11.24
申请号 JP20120134189 申请日期 2012.06.13
申请人 富士フイルム株式会社 发明人 藤牧 一広;小山 一郎;中村 敦;岩井 悠;丹 史郎
分类号 C09J201/02;C09J5/00;C09J11/06;C09J133/00;C09J161/06;C09J175/04;H01L21/02;H01L21/304 主分类号 C09J201/02
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