| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition for producing a resist pattern with excellent mask error factor (MEF).SOLUTION: A resist composition includes (A) resin having an acid-labile group, (B) an acid generator represented by formula (II) and (D) a compound represented by formula (I), where Rand Rrepresent a hydrocarbon group, an alkoxy group, an acyl group, an acyloxy group, an alkoxycarbonyl group, a nitro group or a halogen atom respectively; m' and n' represent an integer of 0-4 respectively; Qand Qrepresent a fluorine atom or a perfluoroalkyl group respectively; Lrepresents a divalent saturated hydrocarbon group; a ring W represents an alicyclic hydrocarbon ring; Rand Rrepresent a fluorine atom or an alkyl fluoride group respectively; s represents an integer of 1-10; and Zrepresents an organic cation. |
