| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor processing device comprising a lifting apparatus for positioning an upper processing room highly relative to a lower processing room at low oscillation. SOLUTION: The semiconductor processing device comprises a lower processing room 203 provided with a test piece placement table, and an upper processing room 202 provided with in-room plasma production means for supplying an electric field and a magnetic field. The semiconductor processing device is for carrying out plasma processing to the test piece on the test piece placement table in a vacuum processing room formed by placing the upper processing room 202 on the lower processing room 203. The semiconductor processing device is provided with a pair of side panels 213 attached in parallel with each other in a vertical direction to the outer wall of the lower processing room 203; a pair of slide guides 204 and 205 which are attached in parallel with the side panels to the opposing surfaces of the inner sides of the pair of side panels 213, and on the side surfaces of which a groove is formed in parallel with the side panel; and a lifting base 207 comprising a convex to be in engagement with the groove formed on the side surface of each of the pair of slide guides and a path for circulating a bearing ball, and supplying the bearing ball to the portion of the engagement of the convex portion and the groove. COPYRIGHT: (C)2008,JPO&INPIT
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