发明名称 |
METHOD AND DEVICE FOR INSPECTION, LITHOGRAPHIC DEVICE, LITHOGRAPHIC PROCESSING CELL, AND METHOD FOR MANUFACTURING DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a fault detection/classification system without increasing complicatedness in calculation and a calculation time caused thereby, in other words, that uses as many data points as possible without reducing a throughput of substrates in a lithographic device. <P>SOLUTION: An abnormality detection/classification method that checks dispersion in a raw data using a raw back-focal-plane image data of radiation from a substrate surface detected by a scatterometer detector, and associates the variation in the raw data that may possibly occur in the lithographic device or a fault that may possibly occur in a process where the substrate surface is patterned is disclosed. The association is performed by comparing the variation in the raw data with known metrological data. After the fault is checked, a user can receive the information on the fault. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008166734(A) |
申请公布日期 |
2008.07.17 |
申请号 |
JP20070302404 |
申请日期 |
2007.11.22 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
MOS EVERHARDUS CORNELIS;DEN BOEF ARIE JEFFREY;SCHAAR MAURITS VAN DER;HOOGENBOOM THOMAS LEO MARIA |
分类号 |
H01L21/027;G01N21/956;H01L21/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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