| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing method, a liquid processing device, and a storage medium for liquid processing, capable of sufficiently suppressing collapse of an uneven pattern formed on a surface of a substrate.SOLUTION: A liquid processing method by a development processing unit U1 comprises the steps of: supplying a developer onto a surface Wa of a wafer W as a process liquid; rinsing the developer on the surface Wa by rotating the wafer W at a rotational speed ω1 while supplying a rinse liquid onto the surface Wa; producing the rinse liquid on the surface Wa as thin film by rotating the wafer W at a rotational speed ω2 smaller than the rotational speed ω1 while supplying a high-concentration gas containing a high-concentration steam of the rinse liquid onto the surface Wa; and drying the surface Wa by evaporating the rinse liquid produced as the thin film on the surface Wa by irradiating the surface Wa with light. |
