发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE SHEET, SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
A photosensitive resin composition which contains a compound represented by general formula (1). (In general formula (1), R1-R4 may be the same or different, and each represents a hydrogen atom or an organic group having 1-4 carbon atoms; and X represents a tetravalent organic group having two or more structural units represented by general formula (2) in the main chain.) (In general formula (2), R5 represents a hydrogen atom or an alkyl group having 1-20 carbon atoms, and a plurality of R5 moieties in one same molecule may be the same as or different from each other.) Provided is a photosensitive resin composition which enables the achievement of a cured film having low stress after being heated and fired, and which has excellent long-term stability, high sensitivity and high resolution. |
申请公布号 |
WO2016158150(A1) |
申请公布日期 |
2016.10.06 |
申请号 |
WO2016JP56053 |
申请日期 |
2016.02.29 |
申请人 |
TORAY INDUSTRIES, INC. |
发明人 |
ONISHI, Hiroyuki;MASUDA, Yuki |
分类号 |
G03F7/023;C08G65/331;C08G65/333;G03F7/004 |
主分类号 |
G03F7/023 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|