发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE SHEET, SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 A photosensitive resin composition which contains a compound represented by general formula (1). (In general formula (1), R1-R4 may be the same or different, and each represents a hydrogen atom or an organic group having 1-4 carbon atoms; and X represents a tetravalent organic group having two or more structural units represented by general formula (2) in the main chain.) (In general formula (2), R5 represents a hydrogen atom or an alkyl group having 1-20 carbon atoms, and a plurality of R5 moieties in one same molecule may be the same as or different from each other.) Provided is a photosensitive resin composition which enables the achievement of a cured film having low stress after being heated and fired, and which has excellent long-term stability, high sensitivity and high resolution.
申请公布号 WO2016158150(A1) 申请公布日期 2016.10.06
申请号 WO2016JP56053 申请日期 2016.02.29
申请人 TORAY INDUSTRIES, INC. 发明人 ONISHI, Hiroyuki;MASUDA, Yuki
分类号 G03F7/023;C08G65/331;C08G65/333;G03F7/004 主分类号 G03F7/023
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