发明名称 LIGHT EMITTING ELEMENT AND LIGHTING DEVICE COMPRISING SAME
摘要 The present disclosure provides a light emitting element, wherein each of first and second semiconductor layers has first and second pits disposed therein, wherein the first pit has a first depth and the second pit has a second depth smaller than the first depth, and the first and second pits are coupled to each other, wherein a density of the second pits in an upper portion of the second semiconductor layer is lower than a density of the second pits in an upper portion of the first semiconductor layer, wherein a density of the first pits in the upper portion of the second semiconductor layer is equal to a density of the first pits in the upper portion of the first semiconductor layer.
申请公布号 US2016380155(A1) 申请公布日期 2016.12.29
申请号 US201415101844 申请日期 2014.10.06
申请人 LG Innotek Co., Ltd. 发明人 JEONG Jong Pil
分类号 H01L33/32;H01L33/24 主分类号 H01L33/32
代理机构 代理人
主权项 1. A light emitting element comprising: a first semiconductor layer; a second semiconductor layer disposed on the first semiconductor layer; an active layer disposed on the second semiconductor layer; and a third semiconductor layer disposed on the active layer, wherein the second semiconductor layer includes a first nitride layer and a second nitride layer on the first nitride layer on the first nitride layer, wherein the first nitride layer is AlGaN-based semiconductor, and the second nitride layer is formed of a different semiconductor from a semiconductor of the first nitride layer, wherein each of the first and second semiconductor layers has first and second pits disposed therein, wherein the first pit has a first depth from a top surface of each of the first and second semiconductor layers, and the second pit has a second depth smaller than the first depth, and the first and second pits are connected to each other, wherein a density of the second pits in an upper portion of the second semiconductor layer is lower than a density of the second pits in an upper portion of the first semiconductor layer, and wherein a density of the first pits in the upper portion of the second semiconductor layer is equal to a density of the first pits in the upper portion of the first semiconductor layer.
地址 Seoul KR