发明名称 Floating semiconductor foils
摘要 One embodiment of the present invention is a method for producing a silicon (Si) and/or germanium (Ge) foil, the method including: dissolving a Si and/or Ge source material in a molten metallic bath at an elevated temperature T2, wherein the density of Si and/or Ge is smaller than the density of the molten metallic bath; cooling the molten metallic bath to a lower temperature T1, thereby causing Si and/or Ge to separate out of the molten metallic bath and to float and grow as a Si and/or Ge foil on a top surface of the molten metallic bath; and separating the floating Si and/or Ge foil from the top surface of the molten metallic bath.
申请公布号 US8603242(B2) 申请公布日期 2013.12.10
申请号 US20100713170 申请日期 2010.02.25
申请人 COHEN URI;ROITBERG MICHAEL 发明人 COHEN URI;ROITBERG MICHAEL
分类号 C30B29/06 主分类号 C30B29/06
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