发明名称 LOW REFRACTIVE INDEX FILM-FORMING COMPOSITION AND METHOD OF FORMING LOW REFRACTIVE INDEX FILM USING THE SAME
摘要 A low refractive index film-forming composition and a low refractive index film of the present invention are formed by the following: mixing silicon alkoxide (B) containing a fluoroalkyl group with silicon alkoxide (A); adding water (C), formic acid (D), and an organic solvent (E) to the mixture to produce hydrolysate of the mixture; and mixing silica sol (F) in which ringed colloidal silica particles are dispersed in a liquid medium with the hydrolysate.
申请公布号 KR20130137086(A) 申请公布日期 2013.12.16
申请号 KR20130064065 申请日期 2013.06.04
申请人 MITSUBISHI MATERIALS CORP. 发明人 HIGANO SATOKO;YAMASAKI KAZUHIKO
分类号 C08K3/36;C08J5/18;C08L83/04;G02B1/11 主分类号 C08K3/36
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