发明名称 Actinic-ray or radiation-sensitive resin composition and method of forming pattern using the composition
摘要 According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds of general formula (I) below, a compound that when exposed to actinic rays or radiation, generates an acid and a hydrophobic resin. (The characters used in general formula (I) have the meanings mentioned in the description.) RN-A−X+  (I)
申请公布号 IL218310(A) 申请公布日期 2016.06.30
申请号 IL20120218310 申请日期 2012.02.26
申请人 FUJIFILM CORPORATION 发明人
分类号 G03F 主分类号 G03F
代理机构 代理人
主权项
地址