发明名称 IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
摘要 An imprint apparatus includes: a stage configured to hold the substrate; a detector configured to detect a relative position between a shot region and the mold in a direction parallel to a surface of the substrate; and a controller configured to obtain, in an imprint process on a shot region different from a target shot region, information relating to a relative position, between the other shot region and the mold, used for aligning the other shot region after bringing the mold and the imprint material into contact with each other, and, when performing the imprint process on the target shot region, adjust a relative position between the target shot region and the mold in the direction by using a detection result on the target shot region and the obtained information.
申请公布号 US2016223918(A1) 申请公布日期 2016.08.04
申请号 US201414917464 申请日期 2014.10.16
申请人 CANON KABUSHIKI KAISHA 发明人 Asano Tosiya;Emoto Keiji
分类号 G03F9/00;G03F7/00 主分类号 G03F9/00
代理机构 代理人
主权项 1. An imprint apparatus for performing an imprint process for forming a pattern of an imprint material for each shot region by bringing the imprint material on a substrate and a mold into contact with each other, the apparatus comprising: a stage configured to hold the substrate; a detector configured to detect a relative position between a shot region and the mold in a direction parallel to a surface of the substrate; and a controller configured to control the imprint process, wherein the controller is configured to obtain, in an imprint process performed in another shot region different from a target shot region, information relating to a relative position between the other shot region and the mold or a moving amount of the other shot region relative to the mold, which was used for aligning the other shot region and the mold with each other in the direction after bringing the mold and the imprint material into contact with each other, and when performing the imprint process on the target shot region, adjust a relative position between the target shot region and the mold in the direction by using a detection result on the target shot region by the detector and the obtained information, and bring the mold and the imprint material into contact with each other to perform the imprint process on the target shot region.
地址 Ohta-ku, Tokyo JP