发明名称 VACUUM PROCESSING APPARATUS
摘要 The present invention provides a vacuum processing apparatus that includes gas supply means having a hard interlock of a pair of gas valves.;The present invention provides a vacuum processing apparatus including: a gas supply unit that supplies gas, for performing vacuum processing using normally closed type air-driven valves, to a processing chamber where the vacuum processing is performed, the gas supply unit having an interlock function in which, when a first valve of a pair of the air-driven valves is opened, a second valve of the pair is closed, the gas supply unit including an air circuit that controls air for driving the air-driven valves, the air circuit being configured using an electromagnetic valve having a solenoid coil corresponding to each of the pair of the air-driven valves.
申请公布号 US2016379857(A1) 申请公布日期 2016.12.29
申请号 US201514908452 申请日期 2015.01.30
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 OGAWA Yoshifumi;KADOTANI Masanori;ISOZAKI Masakazu;NUNOMURA Nobuhide
分类号 H01L21/67;F16K31/06;F16K51/02 主分类号 H01L21/67
代理机构 代理人
主权项 1. A vacuum processing apparatus comprising: a gas supply unit that supplies gas, for performing vacuum processing using normally closed type air-driven valves, to a processing chamber where the vacuum processing is performed, the gas supply unit having an interlock function in which, when a first valve of a pair of the air-driven valves is opened, a second valve of the pair is closed, the gas supply unit comprising an air circuit that controls air for driving the air-driven valves, the air circuit being configured using an electromagnetic valve having a solenoid coil corresponding to each of the pair of the air-driven valves.
地址 Tokyo JP