发明名称 |
VACUUM PROCESSING APPARATUS |
摘要 |
The present invention provides a vacuum processing apparatus that includes gas supply means having a hard interlock of a pair of gas valves.;The present invention provides a vacuum processing apparatus including: a gas supply unit that supplies gas, for performing vacuum processing using normally closed type air-driven valves, to a processing chamber where the vacuum processing is performed, the gas supply unit having an interlock function in which, when a first valve of a pair of the air-driven valves is opened, a second valve of the pair is closed, the gas supply unit including an air circuit that controls air for driving the air-driven valves, the air circuit being configured using an electromagnetic valve having a solenoid coil corresponding to each of the pair of the air-driven valves. |
申请公布号 |
US2016379857(A1) |
申请公布日期 |
2016.12.29 |
申请号 |
US201514908452 |
申请日期 |
2015.01.30 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
OGAWA Yoshifumi;KADOTANI Masanori;ISOZAKI Masakazu;NUNOMURA Nobuhide |
分类号 |
H01L21/67;F16K31/06;F16K51/02 |
主分类号 |
H01L21/67 |
代理机构 |
|
代理人 |
|
主权项 |
1. A vacuum processing apparatus comprising:
a gas supply unit that supplies gas, for performing vacuum processing using normally closed type air-driven valves, to a processing chamber where the vacuum processing is performed, the gas supply unit having an interlock function in which, when a first valve of a pair of the air-driven valves is opened, a second valve of the pair is closed, the gas supply unit comprising an air circuit that controls air for driving the air-driven valves, the air circuit being configured using an electromagnetic valve having a solenoid coil corresponding to each of the pair of the air-driven valves. |
地址 |
Tokyo JP |