发明名称 TESTING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a forming method of a deflecting voltage can copy with both of PVC mode and NVC mode, and to provide a testing device can improve detection sensitivity by reducing scanning deviation of an electron beam caused by noises of a deflection control circuit in an electron beam type testing device based on an electrostatic deflector system of a multi-stage and multi-pole constitution. Ž<P>SOLUTION: In the electron beam type testing device, the deflection control means 2 to control the electrostatic deflector has a deflection waveform forming means 21 to form a deflection control signal, and a deflection signal output means 20 of applying different voltages to respective stages of the electrostatic deflector by amplifying formed control signals and by branching these amplified control signals. In order to apply the different voltages to the respective stages of the electrostatic deflector coping with the voltage set by a charged control means and applied to a charged control electrode, the deflection signal output means 20 has deflection voltage ratio switching means 203 to switch voltage ratios of the control signals applied to the respective stages of the electrostatic deflector. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010020919(A) 申请公布日期 2010.01.28
申请号 JP20080177947 申请日期 2008.07.08
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 RI UEN;MAKUUCHI MASAMI;IMAGAWA KENGO;TAKAHASHI MASAYOSHI;GUNJI YASUHIRO;FUNATSU RYUICHI
分类号 H01J37/147;H01L21/66 主分类号 H01J37/147
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