发明名称 MANUFACTURING METHOD OF NANOWIRE ARRAY
摘要 The present invention relates to a method for manufacturing a nanowire array by using induced growth, wherein inorganic nanowires of a nitride are grown from a seed nitride by forming the seed nitride on a sapphire or silicon substrate, forming an organic nanowire pattern and a dielectric nano-tunnel having the same as a template on top thereof and using the same as an induced-growth mask. The present invention comprises the steps of: forming an organic nanowire array as a template on top of a base layer including a substrate, which is composed of any one among materials capable of selectively growing a nitride, by using a nozzle printing method or the like; forming a dielectric substance on top of the organic nanowire array via a method with an excellent step coverage such as PECVD and sputtering; forming a dielectric nano-tunnel by removing organic nanowires; forming seed crystals for induced growth; and conducting the induced growth of nanowires; and removing the dielectric substance.
申请公布号 KR20160078569(A) 申请公布日期 2016.07.05
申请号 KR20140187927 申请日期 2014.12.24
申请人 POSTECH ACADEMY-INDUSTRY FOUNDATION 发明人 HWANG, SUN YONG;PARK, JUN HYUK;KIM, JONG KYU
分类号 H01L21/02;B82B3/00 主分类号 H01L21/02
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