发明名称 |
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE |
摘要 |
A semiconductor integrated circuit device, including a semiconductor layer of a first conductivity type, a first well region of a second conductivity type, a second well region of the second conductivity type, and a third well region of the first conductivity type. The device further includes an isolation region electrically isolating a predetermined region in the first well region, a first high-concentration region of the second conductivity type, disposed outside the isolation region and inside one of the first well region and the second well region, and a second high-concentration region of the second conductivity type, disposed inside the isolation region and inside one of the first well region and the second well region. The first and second high-concentration regions each have an impurity concentration that is higher than that of the first well region. |
申请公布号 |
US2016308534(A1) |
申请公布日期 |
2016.10.20 |
申请号 |
US201615196764 |
申请日期 |
2016.06.29 |
申请人 |
FUJI ELECTRIC CO., LTD. |
发明人 |
YAMAJI Masaharu |
分类号 |
H03K19/0185;H03K17/567;H01L29/739;H01L29/10;H01L27/082;H01L29/06 |
主分类号 |
H03K19/0185 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor integrated circuit device, comprising:
a semiconductor layer of a first conductivity type; a first well region of a second conductivity type, disposed in the semiconductor layer at a first surface side thereof; a second well region of the second conductivity type, disposed in the semiconductor layer at the first surface side thereof, the second well region contacting the first well region and surrounding a periphery of the first well region, and having an impurity concentration that is lower than that of the first well region; a third well region of the first conductivity type, disposed in the semiconductor layer at the first surface side thereof, the third well region contacting the second well region and surrounding a periphery of the second well region; an isolation region electrically isolating a predetermined region in the first well region; a first high-concentration region of the second conductivity type, disposed outside the isolation region and inside one of the first well region and the second well region, the first high-concentration region having an impurity concentration that is higher than that of the first well region; and a second high-concentration region of the second conductivity type, disposed inside the isolation region and inside one of the first well region and the second well region, the second high-concentration region having an impurity concentration that is higher than that of the first well region. |
地址 |
Kawasaki-shi JP |