发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
摘要 A semiconductor integrated circuit device, including a semiconductor layer of a first conductivity type, a first well region of a second conductivity type, a second well region of the second conductivity type, and a third well region of the first conductivity type. The device further includes an isolation region electrically isolating a predetermined region in the first well region, a first high-concentration region of the second conductivity type, disposed outside the isolation region and inside one of the first well region and the second well region, and a second high-concentration region of the second conductivity type, disposed inside the isolation region and inside one of the first well region and the second well region. The first and second high-concentration regions each have an impurity concentration that is higher than that of the first well region.
申请公布号 US2016308534(A1) 申请公布日期 2016.10.20
申请号 US201615196764 申请日期 2016.06.29
申请人 FUJI ELECTRIC CO., LTD. 发明人 YAMAJI Masaharu
分类号 H03K19/0185;H03K17/567;H01L29/739;H01L29/10;H01L27/082;H01L29/06 主分类号 H03K19/0185
代理机构 代理人
主权项 1. A semiconductor integrated circuit device, comprising: a semiconductor layer of a first conductivity type; a first well region of a second conductivity type, disposed in the semiconductor layer at a first surface side thereof; a second well region of the second conductivity type, disposed in the semiconductor layer at the first surface side thereof, the second well region contacting the first well region and surrounding a periphery of the first well region, and having an impurity concentration that is lower than that of the first well region; a third well region of the first conductivity type, disposed in the semiconductor layer at the first surface side thereof, the third well region contacting the second well region and surrounding a periphery of the second well region; an isolation region electrically isolating a predetermined region in the first well region; a first high-concentration region of the second conductivity type, disposed outside the isolation region and inside one of the first well region and the second well region, the first high-concentration region having an impurity concentration that is higher than that of the first well region; and a second high-concentration region of the second conductivity type, disposed inside the isolation region and inside one of the first well region and the second well region, the second high-concentration region having an impurity concentration that is higher than that of the first well region.
地址 Kawasaki-shi JP