发明名称 SAMPLE SUPPORT BUILT BY SEMICONDUCTOR SILICON PROCESS TECHNIQUE
摘要 PROBLEM TO BE SOLVED: To provide a sample support for fixing a specimen acquired by pin point sampling, without requiring skilled techniques and without the problems of surface flatness, such as mesh or back ground noise. SOLUTION: The sample support is produced from a silicon substrate as the material, the shape and the thickness construction of≤10μm is formed by the semiconductor silicon process technology, and the sample support is stuck on the half-cut mesh so as to avoid the specimen part, and a plurality of fixing parts of the sample are arranged on the same substrate. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006226970(A) 申请公布日期 2006.08.31
申请号 JP20050044604 申请日期 2005.02.21
申请人 SII NANOTECHNOLOGY INC 发明人 IWASAKI KOJI;MUNEKANE MASANAO
分类号 G01N1/28 主分类号 G01N1/28
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