发明名称 SEMICONDUCTOR MANUFACTURING DEVICE WITH EMBEDDED FLUID CONDUITS
摘要 Provided herein are approaches for forming a conduit embedded within a component of a semiconductor manufacturing device (e.g., an ion implanter) using an additive manufacturing process (e.g., 3-D printing), wherein the conduit is configured to deliver a fluid throughout the component to provide heating, cooling, and gas distribution thereof. In one approach, the conduit includes a set of raised surface features formed on an inner surface of the conduit for varying fluid flow characteristics within the conduit. In another approach, the conduit may be formed in a helical configuration. In another approach, the conduit is formed with a polygonal cross section. In another approach, the component of the ion implanter includes at least one of an ion source, a plasma flood gun, a cooling plate, a platen, and/or an arc chamber base.
申请公布号 WO2016172030(A1) 申请公布日期 2016.10.27
申请号 WO2016US28076 申请日期 2016.04.18
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 ABESHAUS, Joshua M.;TYE, Jordan B.
分类号 H01L21/265;H01J37/317 主分类号 H01L21/265
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