发明名称 |
LAMINATE, NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY SEPARATOR INCLUDING THE LAMINATE, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY INCLUDING THE LAMINATE |
摘要 |
Provided is a laminate which is capable of ensuring a high level of safety by preventing an internal short circuit due to, for example, breakage of a non-aqueous electrolyte secondary battery while maintaining various performance capabilities of the non-aqueous electrolyte secondary battery. A laminate (10) includes: a porous film containing polyolefin as a main component; and a porous layer containing fine particles; the porous layer being laminated to at least one side of the porous film, in an electrical conduction test by nail penetration in which test a difference between (a) a test force of the laminate (10) which is brought into electrical conduction and (b) a test force of the laminate (10) in which a dielectric breakdown occurs, the difference being obtained by subtracting the test force (b) from the test force (a), is measured by use of a nail (2) of N50 specified in JIS A 5508 and under a condition in which the nail (2) descends at a descending speed of 50 μm/min, the difference being not less than 5 N and not more than 50 N. |
申请公布号 |
US2016365559(A1) |
申请公布日期 |
2016.12.15 |
申请号 |
US201514771149 |
申请日期 |
2015.07.21 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
YOSHIMARU Chikae;KURAKANE Kosuke;MURAKAMI Chikara |
分类号 |
H01M2/16;H01M10/0525 |
主分类号 |
H01M2/16 |
代理机构 |
|
代理人 |
|
主权项 |
1. A laminate comprising:
a porous film containing polyolefin as a main component; and a porous layer containing fine particles; the porous layer being laminated to at least one side of the porous film, in an electrical conduction test by nail penetration in which test a difference between (a) a test force of the laminate which is brought into electrical conduction and (b) a test force of the laminate in which a dielectric breakdown occurs, the difference being obtained by subtracting the test force (b) from the test force (a), is measured by use of a nail of N50 specified in JIS A 5508 and under a condition in which the nail descends at a descending speed of 50 μm/min, the difference being not less than 5 N and not more than 50 N. |
地址 |
Tokyo JP |