发明名称 Cutting Method and Epitaxial Wafer Manufacturing Method
摘要 <p>A wafer slicing method includes winding a wire around rollers and pressing the wire against an ingot while supplying slurry to the rollers. A previously conducted experiment provides a supply temperature profile of the slurry during the slicing process and the relationship to the axial displacement of the rollers. This relationship is used to implement slurry delivery during the slicing process. The resultant wafers are bowed in a uniform direction. This slicing method provides excellent reproducibility in addition to producing wafers that are bowed in a uniform direction.</p>
申请公布号 KR101356190(B1) 申请公布日期 2014.01.24
申请号 KR20097005661 申请日期 2007.08.22
申请人 发明人
分类号 B24B27/06;B28D5/04;H01L21/301 主分类号 B24B27/06
代理机构 代理人
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