| 摘要 |
An x-ray absorption grid produced by a lithography method for use in a phase-contrast CT system has at least two individual grids arranged atop one another in the radiation direction. Each individual grid has a grid area with a grid structure including grid webs and grid gaps in alternation. Each individual grid has a region outside of the grid area (outer region). The outer region of the at least two individual grids has toothed structures corresponding to one another at least two points. The toothed structures are generated as well in the production of the grid structure. The toothed structures have a position that is defined relative to the grid structure, such that a defined alignment of the individual grids occurs given a combination of the individual grids by engagement of the toothed structures of individual grids lying atop one another.
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