POLARIZED LIGHT IRRADIATING APPARATUS AND METHOD OF IRRADIATING POLARIZED LIGHT FOR PHOTO ALIGNMENT

摘要

An irradiating method includes a first mounting step of mounting a substrate onto a first stage at a first position and a second mounting step of mounting a substrate onto a second stage at a second position, a first movement step of moving the first stage to the irradiation area for irradiating polarized light onto the substrate and returning the first stage to the first position, a second movement step of moving the second stage to the irradiation area and returning the second stage to the second position, a first collecting step of collecting the substrate and a second collecting step of collecting the substrate. A time zone of the first collecting step and first mounting step and a time zone of the second movement step overlap. A time zone of the second collecting step and second mounting step and a time zone of the first movement step overlap.

主权项

1. A polarized light irradiating method for photo alignment using a polarized light irradiating apparatus, the apparatus comprising: an irradiating unit configured to irradiate a polarized light onto a substrate at an irradiation area; a first stage and a second stage, the substrate is configured to be placed on the first stage or the second stage; and a stage movement mechanism configured to cause the substrate on the first or second stage to be irradiated with the polarized light by moving the first or second stage to the irradiation area; wherein
the first stage and second stage each comprises a substrate aligner configured to align the substrate to a predetermined orientation with respect to an axis of the polarized light; the stage movement mechanism is configured to move the first stage from a first position at one side of the irradiation area to the irradiation area where the substrate on the first stage is irradiated with the polarized light, and to return the first stage to the first position after passage through the irradiation area; the stage movement mechanism is configured to move the second stage from a second position at the other side of the irradiation area to the irradiation area where the substrate on the second stage is irradiated with the polarized light, and to return the second stage to the second position after passage of the second stage through the irradiation area; a space larger than a length by which the substrate on the second stage passes through the irradiated area is secured between the first stage positioned at the first position and the irradiated area, and a space larger than a length by which the substrate on the first stage passes through the irradiated area is secured between the second stage positioned at the second position and the irradiated area; wherein the method comprising: a first mounting step of mounting a first substrate onto the first stage at the first position; a second mounting step of mounting a second substrate onto the second stage at the second position; a first movement step comprising:
moving the first stage with the first substrate from the first position to the irradiation area; andreturning the first stage to the first position from the irradiation area after passage of the first substrate through the irradiating area; a second movement step comprising:
moving the second stage with the second substrate from the second position to the irradiation area; andreturning the second stage to the second position from the irradiation area after passage of the second substrate through the irradiating area; a first collecting step of collecting the first substrate from the first stage at the first position; a second collecting step of collecting the second substrate from the second stage at the second position; wherein a time zone of the first collecting step and the first mounting step and a time zone of the second movement step overlap partially or entirely; and a time zone of the second collecting step and the second mounting step and a time zone of the first movement step overlap partially or entirely.