| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with excellent line edge roughness can be produced.SOLUTION: The resist composition comprises a resin having a structural unit expressed by formula (I) and an acid generator expressed by formula (II). In the formulae, ring Trepresents a sultone ring optionally having a substituent; Zrepresents an alkanediyl group optionally having a substituent, or the like; Zrepresents a single bond or a carbonyl group; Rrepresents an alkyl group optionally having a halogen atom, a hydrogen atom or a halogen atom; Xrepresents an alkanediyl group which may be substituted with a hydroxy group or the like; Rrepresents a hydrocarbon group which may be substituted with a fluorine atom or a hydroxy group; and Zrepresents an organic cation. |
