MANUFACTURING METHOD FOR ARRAY SUBSTRATE, ARRAY SUBSTRATE AND DISPLAY DEVICE

摘要

Provided are a manufacturing method for an array substrate (2210), an array substrate (2210) and a display device (2200), which belong to the technical field of display. The manufacturing method comprises: forming a metallic pattern (120) with the thickness of d on a substrate (110); forming an insulating film layer (130) on the substrate (110) on which the metallic pattern (120) is formed, such that an overlap area of the insulating film layer (130) and the metallic pattern (120) exists, wherein an absolute value of a height difference between the overlap area of the insulating film layer (130) and other areas of the insulating film layer (130) is less than the thickness d; and forming a semiconductor layer (A) and a source-drain metallic layer pattern (B) on the substrate (110) on which the insulating film layer (130) is formed. By enabling the absolute value of the height difference between the overlap area of the insulating film layer (130) and the other areas of the insulating film layer (130) to be less than the thickness d, so that fluctuations of other patterns formed on the substrate (110) on which the insulating film layer (130) is formed accordingly decrease, the effects of decreasing a line breakage rate of routing formed on the insulating film layer (130) and improving a product yield are achieved.