Display panel preventing reflection of external light and display apparatus having the same

摘要

A liquid crystal display (LCD) panel is provided, including a lower substrate; an upper substrate disposed to face the lower substrate; a liquid crystal layer disposed between the upper substrate and the lower substrate; a lower polarizing layer with a structure of wire grid formed on one surface of the lower substrate and configured to provide polarizing-filtering of light radiated from a backlight; and an upper polarizing layer with a structure of wire grid formed on one surface of the upper substrate and configured to provide polarizing-filtering of the radiated light passing through the lower polarizing layer and the liquid crystal layer, at least one of the wire grid of the lower polarizing layer and the wire grid of the upper polarizing layer including a reflection layer configured to reflect the radiated light and an absorbing layer configured to absorb external light incident from the outside through the upper substrate.

主权项

1. A liquid crystal display (LCD) panel comprising:
a lower substrate; an upper substrate disposed to face the lower substrate; a liquid crystal layer disposed between the upper substrate and the lower substrate; a lower polarizing layer with a structure of wire grid formed on one surface of the lower substrate and configured to provide polarizing-filtering of light radiated from a backlight; and an upper polarizing layer with a structure of wire grid formed on one surface of the upper substrate and configured to provide polarizing-filtering of the radiated light passing through the lower polarizing layer and the liquid crystal layer, wherein the wire grid of the lower polarizing layer comprises a reflection layer configured to reflect the radiated light and an absorbing layer configured to absorb external light incident from the outside through the upper substrate, wherein the reflection layer and the absorbing layer are stacked in sequence on the one surface of the lower substrate, and wherein the absorbing layer is configured to have a higher etching easiness than the reflection layer.