| 摘要 |
<p>A reflection apparatus is provided to restrict heat generation caused by a second actuator comprising a magnetic member and an electromagnet and to be suitably used as a composition device in a projection optical system of an exposure apparatus. A reflection apparatus includes a mirror(1) and a first and a second actuators(4). The first actuator is constituted to determine a position of the mirror. A second actuator is constituted to deform the mirror. The second actuator comprises a magnetic member and an electromagnet, wherein the magnetic member is attached at the mirror, and the electromagnet is positioned facing to the magnetic member by contactless.</p> |
