发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus for processing a substrate in the levitation transfer system of simple, low-cost structure. SOLUTION: A plurality of rollers or side rollers 110 are arranged linearly in a constant pitch in the transfer direction in both right and left sides of a stage 80 viewed from the transfer direction (direction X). While the substrate G is levitated in the space above the stage 80 with pressure of gas received from an injection hole 100 just under the substrate (upper surface of the stage), both right and left side end portions of the substrate are placed on the side rollers 110 in both sides of the stage. With rotating movement of the side roller 110, the substrate G levitated on the stage 80 moves flat in the transfer direction (direction X) while it is continuously transferred by rotation on the side roller 110. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008166359(A) 申请公布日期 2008.07.17
申请号 JP20060351688 申请日期 2006.12.27
申请人 TOKYO ELECTRON LTD 发明人 INAMASU HISASHI;OTA YOSHIHARU;IKEDA FUMIHIKO;YAMAZAKI TAKESHI;OTSUKA KEISUU
分类号 H01L21/677;B65G49/06;B65G49/07;H01L21/027 主分类号 H01L21/677
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