发明名称 ELECTRON BEAM APPLICATION DEVICE, AND STABLE OPERATIONAL STATE DECIDING METHOD OF ELECTRON SOURCE
摘要 PROBLEM TO BE SOLVED: To improve operation rate and reliability of movement of an electron beam application device. SOLUTION: In the center control part 12 of a scanning electron microscope 100, based on detected data detected from detecting devices such as a beam current detector 8, a vacuum pressure detector 10, an emission current detecting part 21, and a pulling-out voltage detecting part 22 or the like, it is determined whether an electron source of an electron gun 1 reaches a stable operation state or not, and the result is displayed on a display 18. Furthermore, the central control part 12 makes an approximation formula which expresses time transition based on detected data or the time transition of average value, variation width and stability about the detected data, calculates time when value of the approximation formula reaches a prescribed value and thereby estimates stable operation establishing time of an electron source, and displays the estimated stable operation establishing time on a display 18. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008166220(A) 申请公布日期 2008.07.17
申请号 JP20070000017 申请日期 2007.01.04
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TANAKA TOKUYUKI;UMEHARA SATOSHI
分类号 H01J37/06 主分类号 H01J37/06
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