| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proximity scan exposure device capable of carrying out high precision exposure without damaging a mask even if a foreign matter exists on a transferred substrate, and to provide a control method thereof. <P>SOLUTION: This proximity scan exposure device 1 has a foreign matter detecting mechanism 40 for detecting dust on the substrate W on a substrate transferring mechanism 10 on the transfer side of a plurality of mask holding portions 11. When the dust adhered to the substrate W is detected by the foreign matter detecting mechanism 40, a control portion 15 drives a mask driving portion 12 according to the height of the dust and prevents the breakage of the mask M caused by contact with the dust. <P>COPYRIGHT: (C)2009,JPO&INPIT |
