发明名称 A METHOD FOR FABRICATING BLACKENED CONDUCTIVE PATTERNS
摘要 <p>The present invention relates to a method for fabricating blackened conductive patterns, which includes (i) forming a resist layer on a non- conductive substrate; (ii) forming fine pattern grooves in the resist layer using a laser beam; (iii) forming a mixture layer containing a conductive material and a blackening material in the fine pattern grooves; and (iv) removing the resist layer remained on the non -conductive substrate. The method for blackening conductive patterns according to the present invention has, unlike a conventional method using chemical etching, advantages that productivity is enhanced as the process steps is simplified, environmental problem such as disposal of an etching solution is not generated as chemical etching is not used, and high resolution patterns with and superior conductivity and blackened degree can be fabricated.</p>
申请公布号 WO2009075520(A1) 申请公布日期 2009.06.18
申请号 WO2008KR07307 申请日期 2008.12.10
申请人 INKTEC CO., LTD.;CHUNG, KWANG CHOON;YOO, JI HOON;KIM, BYUNG HUN;KIM, SU HAN 发明人 CHUNG, KWANG CHOON;YOO, JI HOON;KIM, BYUNG HUN;KIM, SU HAN
分类号 H05K3/02 主分类号 H05K3/02
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