| 摘要 |
Methods of fabricating solar cells having trench-free emitter regions are described. In an example, a solar cell includes a substrate. A thin dielectric layer is disposed on a portion of the back surface of the substrate. A first polycrystalline silicon emitter region is disposed on a first portion of the thin dielectric layer and doped with an impurity of a first conductivity type. A second polycrystalline silicon emitter region is disposed on a second portion of the thin dielectric layer proximate to the first polycrystalline silicon emitter region disposed on the first portion of the thin dielectric layer. The second polycrystalline silicon emitter region is doped with an impurity of a second, opposite, conductivity type. A total concentration of the impurity of the first conductivity type is at least an order of magnitude greater than a total concentration of the impurity of the second conductivity type. |
