Mask processing using films with spatially selective birefringence reduction

摘要

Certain patternable reflective films are used as masks to make other patterned articles, and one or more initial masks can be used to pattern the patternable reflective films. An exemplary patternable reflective film has an absorption characteristic suitable to, upon exposure to a radiant beam, absorptively heat a portion of the film by an amount sufficient to change a first reflective characteristic to a different second reflective characteristic. The change from the first to the second reflective characteristic is attributable to a change in birefringence of one or more layers or materials of the patternable film. In a related article, a mask is attached to such a patternable reflective film. The mask may have opaque portions and light-transmissive portions. Further, the mask may have light-transmissive portions with structures such as focusing elements and/or prismatic elements.

主权项

1. A composite article comprising:
a film mask including a first group of layers arranged to extend continuously from a first zone to a second zone and selectively reflect light by constructive or destructive interference to provide a first reflective characteristic in the first zone and a second reflective characteristic in the second zone, the film mask having a first absorbing characteristic suitable to, upon exposure to a first radiant beam, absorptively heat a portion of the film mask by an amount of sufficient to change the first reflective characteristic to the second reflective characteristic, wherein the change from the first reflective characteristic to the second reflective characteristic is substantially attributable to a change in birefringence of at least some of the first group of layers of the film mask; and a patternable film beneath the film mask and connected to the film mask in a layered arrangement, the patternable film having a first detectable characteristic at a selected portion that changes to a different second detectable characteristic upon exposure to a second radiant beam through the film mask, wherein the film mask is capable of patterning the second radiant beam therethrough to change the first detectable characteristic to the second detectable characteristic at the selected portion of the patternable film.