发明名称 ARRAY SUBSTRATE AND ITS MANUFACTURING METHOD AND DISPLAY DEVICE
摘要 An array substrate and its manufacturing method, and a display device are disclosed, and the array substrate includes a black matrix (200) disposed on a base substrate (100) and has a plurality of pixel units arranged in an array, the orthographic projection of the pattern of the black matrix (200) on the base substrate at least partially covers the gap between adjacent pixel units, and the surface of at least a portion of the black matrix (200) has a first concave-convex structure (A) capable of reflecting the light irradiated to the surface of the black matrix (200) in diffuse reflection. Because the first concave-convex structure (A) of the surface of the black matrix (200) has a diffuse reflection effect, the external light will be subjected to diffuse reflection when irradiated to the surface of the black matrix (200), thereby reducing the light intensity of the reflected light, enhancing the visibility of the area of each of the pixel units of the array substrate, and improving the display effect of picture.
申请公布号 US2016306241(A1) 申请公布日期 2016.10.20
申请号 US201514784750 申请日期 2015.05.04
申请人 BOE TECHNOLOGY GROUP CO., LTD. 发明人 CHOI Seungjin
分类号 G02F1/1362;H01L27/12;G02F1/1343;H01L27/32;G02F1/1335;G02F1/1333 主分类号 G02F1/1362
代理机构 代理人
主权项 1. An array substrate, comprising: a base substrate and a black matrix disposed on the base substrate, wherein the array substrate comprises a plurality of pixel units arranged in an array, the orthographic projection of the pattern of the black matrix on the base substrate at least partially covers a gap between the adjacent pixel units, and a surface of at least a portion of the black matrix comprises a first concave-convex structure capable of reflecting the light irradiated to the surface of the black matrix in diffuse reflection.
地址 Beijing CN