发明名称 |
METHOD AND APPARATUS FOR REMOVING A LIQUID FROM A SURFACE OF A ROTATING SUBSTRATE |
摘要 |
A method and an apparatus for removing a liquid, i.e a wet processing liquid, from a surface of at least one substrate is disclosed. A liquid is supplied on a surface of substrate. Simultaneously or thereafter besides the liquid also a gaseous substance can be supplied thereby creating at least locally a sharply defined liquid-vapor boundary. The gaseous substance and the liquid can be selected such that the gaseous substance is miscible with the liquid and when mixed with the liquid yields a mixture having a surface tension lower than that of the liquid. According to the invention, the substrate is subjected to a rotary movement at a speed to guide said liquid-vapor boundary over said substrate thereby removing said liquid from said substrate.
|
申请公布号 |
US2001042559(A1) |
申请公布日期 |
2001.11.22 |
申请号 |
US19980159801 |
申请日期 |
1998.09.23 |
申请人 |
MERTENS PAUL;MEURIS MARK;HEYNS MARC |
发明人 |
MERTENS PAUL;MEURIS MARK;HEYNS MARC |
分类号 |
G03F7/42;H01L21/00;H01L21/306;H01L21/311;H01L21/768;(IPC1-7):B08B5/00 |
主分类号 |
G03F7/42 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|