| 摘要 |
PROBLEM TO BE SOLVED: To obtain an Ru target material which has high purity and good sputtering characteristics and machining characteristics. SOLUTION: The Ru target material has a relative density of >=98%, and the average crystal grain size in the microstructure is 8 to 100μm. Also, the area ratio of the grains of 10 to 100μm present in a fractured face is >=50 area%. Further, the Ru target material preferably has purity of >=5 N, hardness of <=400 Hv, deflective strength of >=350 MPa, and thermal conductivity of >=120 W/m.K.
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