| 发明名称 |
HARD-MASK COMPOSITION COMPRISING SOLUTION PROCESSABLE CARBON ALLOTROPES, METHOD FOR MANUFACTURING HARD-MASK USING SAME, AND HARD-MASK |
| 摘要 |
The present invention relates to: a hard-mask composition for an organic hard mask which has high etching resistance and is solution processable, the hard-mask composition comprising a polymer binder, carbon allotropes and an organic solvent; a method for manufacturing such a hard-mask; and a hard-mask. |
| 申请公布号 |
WO2016129927(A1) |
申请公布日期 |
2016.08.18 |
| 申请号 |
WO2016KR01379 |
申请日期 |
2016.02.11 |
| 申请人 |
PUSAN NATIONAL UNIVERSITY INDUSTRYUNIVERSITY COOPERRATION FOUNDATION |
发明人 |
YANG, Seung Yun;LEE, Seunghyun |
| 分类号 |
C08K3/04;C08L101/00;H01L21/02;H01L21/033 |
主分类号 |
C08K3/04 |
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