REWORK METHOD OF ARRAY SUBSTRATE FOR DISPLAY DEVICE AND ARRAY SUBSTRATE FORMED BY THE METHOD

摘要

The present invention provides a method of reworking an array substrate including a gate metal layer, a gate insulation layer (G1), a semiconductor layer, a source/drain metal layer, a lower passivation layer, a common electrode layer, an upper passivation layer, and a pixel electrode layer sequentially formed therein. By using a rework mask protecting a jumping passivation hole area in reworking the pixel electrode layer, the method can maintain the electric connection between the common electrode layer and the rework pixel electrode pattern in the jumping passivation hole area even after the pixel electrode rework process, to thereby reduce the occurrence of failure and the reduction of throughput due to the rework process.

主权项

1. A display device including an array substrate, the array substrate comprising:
a lower passivation layer, a common electrode layer and an upper passivation layer, which are formed in an active area including a pixel; a common voltage metal line formed in a first area of a non-active area outside of the active area, the common voltage metal line supplying a common voltage to the pixel; a remnant pixel electrode pattern formed in a jumping passivation hole in a second area of the non-active area, the second area closer to the active area than the first area, the remnant pixel electrode pattern electrically coupled to the common electrode layer; and a rework pixel electrode pattern extending between the remnant pixel electrode pattern formed in the jumping passivation hole in the second area of the non-active area and the common voltage metal line formed in the first area of the non-active area, the rework pixel electrode pattern electrically coupling the remnant pixel electrode pattern and the common voltage metal line.