发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD, AND MANUFACTURING METHOD FOR DEVICE
摘要 PROBLEM TO BE SOLVED: To drive a stage accurately.SOLUTION: An exposure device includes a stage device having a stage WST for holding a substrate W, and an electromagnetic motor for driving the stage WST, an encoder system (50A-50D) having a plurality of heads 48 for irradiating the reflective lattices (44A-44D) arranged substantially in parallel with the XY plane, respectively, with a beam, and measuring the position information of the stage WST by means of the heads facing the lattices out of the plurality of heads 48 and a control system controlling the stage device on the basis of measurement information of the encoder system. By the movement of the stage WST, the heads facing the lattices change from one of three heads or four heads to the other, and the control system controls driving of the stage WST while compensating for the measurement error of the encoder system resulting from at least one of the lattices and heads.
申请公布号 JP2014060448(A) 申请公布日期 2014.04.03
申请号 JP20130259706 申请日期 2013.12.17
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 H01L21/027;H01L21/68 主分类号 H01L21/027
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