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发明名称
PLASMA REACTOR WITH OVERHEAD RF ELECTRODE TUNED TO THE PLASMA WITH ARCING SUPPRESSION
摘要
申请公布号
EP1459351(A2)
申请公布日期
2004.09.22
申请号
EP20020773574
申请日期
2002.09.25
申请人
APPLIED MATERIALS, INC.
发明人
HOFFMAN, DANIEL, J.;YIN, GERALD, ZHEYAO;YE, YAN;KATZ, DAN;BUCHBERGER, DOUGLAS, A., JR.;ZHAO, XIAOYE;CHIANG, KANG-LIE;HAGEN, ROBERT, B.;MILLER, MATTHEW, L.
分类号
H05H1/46;H01J37/32;H01L21/205;H01L21/3065;(IPC1-7):H01J37/32
主分类号
H05H1/46
代理机构
代理人
主权项
地址
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