| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin for patterning, which shows a great change in a refractive index between before and after irradiation with light and which can be suitably used for an optical member, and to provide a resin composition including the resin and an optical member using the composition.SOLUTION: The photosensitive resin for patterning has a structural unit (I) expressed by general formula (1), in which at least a part of the structural unit (I) is changed into a structural unit (II) expressed by general formula (2) by irradiation with ultraviolet light. The difference between a refractive index before the irradiation with ultraviolet light and a refractive index after the irradiation is 0.005 or more. |
