发明名称 |
METHOD FOR MANUFACTURING MAGNETORESISTANCE ELEMENT AND APPARATUS FOR MANUFACTURING MAGNETORESISTANCE ELEMENT |
摘要 |
<p>This invention provides a method for manufacturing a magnetoresistance element having a high MR ratio despite low RA and an apparatus for manufacturing a magnetoresistance element. A magnetoresistance element comprising an MgO (magnesium oxide) layer between a first ferromagnetic layer and a second ferromagnetic layer is produced by forming the MgO layer within a film forming chamber in which a material having a high gettering effect against oxidizing gases such as oxygen and water is applied onto the surface of constituent members, provided within the MgO layer forming chamber, for example, a film forming chamber inner wall (37) within a first film forming chamber (21), an inner wall in a deposition-preventive shield (36), a partition plate (22), and a shutter. The material having a high gettering effect may be a material having an oxygen gas adsorption energy value of not less than 145 kcal/mol. Ta (tantalum) as a material for constituting the magnetoresistance element is particularly preferred.</p> |
申请公布号 |
WO2007105472(A1) |
申请公布日期 |
2007.09.20 |
申请号 |
WO2007JP53487 |
申请日期 |
2007.02.26 |
申请人 |
CANON ANELVA CORPORATION;NAGAMINE, YOSHINORI;TSUNEKAWA, KOJI;JAYAPRAWIRA, DAVID;MAEHARA, HIROKI |
发明人 |
NAGAMINE, YOSHINORI;TSUNEKAWA, KOJI;JAYAPRAWIRA, DAVID;MAEHARA, HIROKI |
分类号 |
H01L43/12;H01L43/08 |
主分类号 |
H01L43/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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