发明名称 Vacuum Processing Device
摘要 To provide a vacuum processing apparatus applicable to various manufacturing processes, by efficiently and highly reliably stacking films of various types and thicknesses and by downsizing the manufacturing apparatus by suppressing size increase of the apparatus due to increase of the number of film forming chambers caused by increase and complexity of process steps. A vacuum processing apparatus is provided with a plurality of film forming process parts which are provided with rotating transfer tables and film forming chambers. The rotating transfer tables form a transfer path for a work to be processed, in chambers which can be vacuum-exhausted. The film forming chambers are provided for depositing a film on the work to be processed which is arranged and transferred along a circumference which has a rotating shaft of the rotating transfer table as a center. The vacuum processing apparatus is also provided with a connecting part which connects the film forming process parts so as to share a vacuum space between the chambers, and the work to be processed in the film forming process parts is mutually transferred in the vacuum. A load lock mechanism is provided in one of the film forming process part or in the connecting part.
申请公布号 US2008029023(A1) 申请公布日期 2008.02.07
申请号 US20050596872 申请日期 2005.05.16
申请人 SHIBAURA MECHATRONICS CORPORATION 发明人 IKEDA JIRO;TAKIZAWA YOJI
分类号 C23C14/56;B05C11/02;C23C14/00;G11B7/26 主分类号 C23C14/56
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