HOLE FORMING METHOD, MEASURING APPARATUS AND CHIP SET

摘要

A pore forming method in which a pore is formed in such a way that a first voltage is applied between electrodes that are disposed with a film in an electrolytic solution therebetween; a second voltage, which is lower than the first voltage, is applied between the electrodes; a current that flows between the electrodes owing to the application of the second voltage is measured; it is judged whether a value of a current is equal to or larger than a predefined threshold; and if the value of the current is smaller than the threshold, the above sequence is repeated until a pore is formed. In this case, the second voltage is a voltage that makes the value (IPF) of the current flowing through the film practically 0. With the use of the above method, a nanopore is formed in the film simply, easily, and accurately.

主权项

1. A method of forming a pore in a film comprising:
a first step of applying a first voltage between a first electrode and a second electrode, both first and second electrodes being disposed with the film in an electrolytic solution therebetween; a second step of applying a second voltage, which is lower than the first voltage, between the first electrode and the second electrode after the first voltage is applied and measuring a value of a current that flows between the first electrode and the second electrode owing to the application of the second voltage; and a third step of judging whether the value of the current is equal to or larger than a predefined threshold, wherein, if the value of the current is smaller than the threshold in the third step, the first step and the second step are repeated.