发明名称 MICROCHIP AND CHANNEL STRUCTURE FOR THE SAME
摘要 A microchip includes a channel permitting a sheath liquid to flow therethrough; and a microtube for introducing a sample liquid into a laminar flow of the sheath liquid flowing through the channel; wherein liquid feeding is performed in the condition where a laminar flow of the sample liquid introduced through the microtube is surrounded by the laminar flow of the sheath liquid.
申请公布号 US2016332162(A1) 申请公布日期 2016.11.17
申请号 US201615221261 申请日期 2016.07.27
申请人 Sony Corporation 发明人 Shinoda Masataka;Takashimizu Toru
分类号 B01L3/00;G01N15/14 主分类号 B01L3/00
代理机构 代理人
主权项 1. A microchip comprising: two substrates each having a main surface extending in a y-axis direction and an x-axis direction; a channel formed between the substrates; a sample inlet provided on at least one of the substrates, the sample inlet configured to permit a sample liquid to be introduced into the channel; and a sheath inlet provided on at least one of the substrates, the sheath inlet configured to permit a sheath liquid to be introduced into the channel, wherein the channel is configured to permit the sheath liquid and the sample liquid to flow therethrough in a positive x-axis direction such that a laminar flow of the sample liquid is surrounded by a laminar flow of the sheath liquid therein, the channel having first walls opposed to one another in a z-axis direction perpendicular to the main surfaces of the substrates, and the channel having second walls opposed to one another in the y-axis direction, wherein the channel includes a narrow-down section, the first walls and the second walls have inclined surfaces extending in the x-axis direction therein so that a cross sectional area of the channel perpendicular to the x-axis direction is reduced in the positive x-axis direction, and wherein the inclined surface of one of the first walls extends in a positive z-axis direction in the positive x-axis direction, and the inclined surface of the other of the first walls extends in a negative z-axis direction in the positive x-axis direction.
地址 Tokyo JP