| 摘要 |
The present invention provides improved electrode and an improved process for constructing electrodes by depositing and annealing platinum onto a substrate such that the Pt films are smooth, of the proper orientation, and thermally stable. The improved electrodes are constructed by depositing Pt onto a non-reactive non-oxidating substrate, e.g., a thermally oxidized silicon wafer, using a technique such as physical vapor deposition (PVD). |
