| 摘要 |
An exposure apparatus includes a first land surface 75 which faces a surface of a substrate and which surrounds an optical path space K1 for an exposure light beam, a second land surfaces 76 which faces the surface of the substrate and which is provided outside the first land surface 75 in a predetermined direction, and a recovery port 22 which is provided to recover a liquid for filling the optical path space K1 therewith. The first land surface 75 is provided subsequently in parallel to the surface of the substrate. The second land surface 76 is provided at positions separated farther from the surface of the substrate than the first land surface 75. The recovery port 22 is provided outside the first land surface 75 and the second land surface 76. Even when the exposure is performed while moving the substrate, the optical path space for the exposure light beam can be filled with the liquid in a desired state. |
