发明名称 DEVICE MANUFACTURED BY ROOM-TEMPERATURE BONDING, DEVICE MANUFACTURING METHOD, AND ROOM-TEMPERATURE BONDING APPARATUS
摘要 An inter-substrate material layer is formed between a first substrate and a second substrate to generate a bonding strength. A plurality of metal elements are present in the inter-substrate material layer. An interface element existence ratio of the plurality of metal elements is 0.07 or above. A device can be obtained in which substrates difficult to bond (for example, SiO2 substrates) are bonded at room-temperature to have practical bonding strength.
申请公布号 US2016250838(A1) 申请公布日期 2016.09.01
申请号 US201615149891 申请日期 2016.05.09
申请人 MITSUBISHI HAEVY INDUSTRIES MACHINE TOOL CO., LTD. 发明人 UTSUMI Jun;GOTO Takayuki;IDE Kensuke;FUNAYAMA Masahiro;TAKAGI Hideki
分类号 B32B38/00;C23C14/58;C23C14/34;B32B37/14;C23C14/14 主分类号 B32B38/00
代理机构 代理人
主权项 1. A method of manufacturing a device, comprising: performing sputtering on a surface of a first substrate; attaching one or more metal elements onto the surface of said first substrate; and bonding a second substrate to the surface of said first substrate at room temperature, wherein an interface element existence ratio of said one or more metal elements is 0.07 or above.
地址 Ritto-shi JP