发明名称 |
DEVICE MANUFACTURED BY ROOM-TEMPERATURE BONDING, DEVICE MANUFACTURING METHOD, AND ROOM-TEMPERATURE BONDING APPARATUS |
摘要 |
An inter-substrate material layer is formed between a first substrate and a second substrate to generate a bonding strength. A plurality of metal elements are present in the inter-substrate material layer. An interface element existence ratio of the plurality of metal elements is 0.07 or above. A device can be obtained in which substrates difficult to bond (for example, SiO2 substrates) are bonded at room-temperature to have practical bonding strength. |
申请公布号 |
US2016250838(A1) |
申请公布日期 |
2016.09.01 |
申请号 |
US201615149891 |
申请日期 |
2016.05.09 |
申请人 |
MITSUBISHI HAEVY INDUSTRIES MACHINE TOOL CO., LTD. |
发明人 |
UTSUMI Jun;GOTO Takayuki;IDE Kensuke;FUNAYAMA Masahiro;TAKAGI Hideki |
分类号 |
B32B38/00;C23C14/58;C23C14/34;B32B37/14;C23C14/14 |
主分类号 |
B32B38/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a device, comprising:
performing sputtering on a surface of a first substrate; attaching one or more metal elements onto the surface of said first substrate; and bonding a second substrate to the surface of said first substrate at room temperature, wherein an interface element existence ratio of said one or more metal elements is 0.07 or above. |
地址 |
Ritto-shi JP |