发明名称 PATTERN FORMING METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a pattern forming method that enables highly accurate processing.SOLUTION: A pattern forming method for forming a pattern for an electronic device on a surface to be processed of a long sheet substrate having flexibility while transporting the sheet substrate in a long-length direction includes the steps of: while supporting the sheet substrate by guide members at two positions separated from each other in the long-length direction by a distance L, applying a long-length direction tension to a portion of the sheet substrate corresponding to the distance L to form, between the two positions of the sheet substrate, a stable region, in which a dimension in the short-length direction orthogonal to the long-length direction becomes substantially constant after being shrunk at a predetermined degree, to have a predetermined width in the long-length direction; and forming a pattern for an electronic device on a flat portion of the surface to be processed corresponding to the stable region of the sheet substrate.SELECTED DRAWING: Figure 2
申请公布号 JP2016197241(A) 申请公布日期 2016.11.24
申请号 JP20160121707 申请日期 2016.06.20
申请人 NIKON CORP 发明人 HORI MASAKAZU;NARA KEI;YOKOTA MUNEYASU
分类号 G03F9/00;B65H20/10;B65H23/038;B65H23/188;G03F7/20;H01L21/677 主分类号 G03F9/00
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