| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a pellicle for lithography in which a damage given to a pellicle composed of a pellicle frame and a distortion given to a mask are small when pasting the pellicle to the mask.SOLUTION: In a method of manufacturing a pellicle composed of a pellicle frame having a flat adhesive layer formed on one end face, the pellicle is manufactured by preliminarily measuring a distortion of a mask when pasting the pellicle frame to the mask the surface of which is coated with a curable silicone composition through the adhesive layer, and by selecting only a pellicle frame whose mask distortion is within an allowable range. The allowable range of a mask distortion is less than 0.1 μm, preferably 0.05 μm or less.SELECTED DRAWING: None |
